ICP Dry Etcher Simulation Analysis (CUDA) | samadii plasma from kr in chemistry Watch Video
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Description: ⚛Inductively Coupled Plasma (ICP) is a high-temperature ionization technique used in analytical chemistry and various industrial processes. It involves creating a high-temperature plasma by applying radiofrequency (RF) energy to a gas, typically argon.nnIn the context of semiconductor processing, dry etching is a method used to selectively remove material from a substrate to create patterns or features.ICP is known for its high temperature, stability, and uniformity, making it suitable for var
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